Abstract Single layer and multilayer films consisting of SnO 2 , Ta 2 O 5 , SiO 2 , TiO 2 , indium tin oxide (ITO) and antimony tin oxide (ATO) have been prepared by sol-gel dip coating technique. All of the multilayer films contained a SiO 2 top layer, which was composed of SiO 2 nanoparticles. The other films had polymeric character. Obtained films were characterized by ellipsometry, XRD, AFM and SEM. Light transmittance values of the films were compared. Films other than SiO 2 and Ta 2 O 5 were found to have crystalline structure. Thickness values of the films were in the range of 30–115 nm and roughness values were in 1.2–23 nm range. Single layer porous silica provided 95% light transmittance, whereas ITO-TiO 2 -SiO 2 multilayer film provided a light transmittance of 97.2%.

中文翻译：

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通过溶胶-凝胶工艺制备和表征多层抗反射涂层

摘要 采用溶胶-凝胶浸涂技术制备了由SnO 2 、Ta 2 O 5 、SiO 2 、TiO 2 、氧化铟锡(ITO)和氧化锑锡(ATO)组成的单层和多层薄膜。所有多层膜都包含由SiO 2 纳米颗粒组成的SiO 2 顶层。其他薄膜具有聚合物特性。得到的薄膜通过椭偏仪、XRD、AFM 和 SEM 进行表征。比较了薄膜的透光率值。发现除SiO 2 和Ta 2 O 5 之外的膜具有晶体结构。薄膜的厚度值在 30-115 nm 范围内，粗糙度值在 1.2-23 nm 范围内。单层多孔二氧化硅提供95%的透光率，而ITO-TiO 2 -SiO 2 多层膜提供97.2%的透光率。