A precursor polymer has been designed on the basis of an idea of conversion of hyperbranched polymer to an inorganic substance by lithographic procedure. For this purpose hyperbranched polyethoxysiloxane (PEOS) was synthesized via a one-pot catalytic condensation reaction of tetraethoxysilane with acetic anhydride. PEOS was modified with cyclohexanol via a catalytic trans-esterification reaction. The products were characterized by means of ¹H and ²⁹Si NMR spectroscopy, elemental analysis and size exclusion chromatography. The thin silica films were formed by spin-coating of chloroform solutions of PEOS and cyclohexanol-modified PEOS (CH-PEOS) on silicon wafer substrates with subsequent H₂-plasma treatment. CH-PEOS layer containing a photoacid could be cross-linked upon UV-irradiation. This approach was used to develop patterned thin silica films, which were analyzed by field emission scanning electron microcopy and atomic force microscopy. Well defined sharp silica patterns were obtained and further conversion of the layer to pure silica was carried out by removing organic species using H₂ plasma treatment.

基于通过光刻法将超支化聚合物转变为无机物质的思想，设计了前体聚合物。为此，通过四乙氧基硅烷与乙酸酐的一锅催化缩合反应合成了超支化聚乙氧基硅氧烷（PEOS）。PEOS用环己醇通过催化酯交换反应进行了改性。产物通过¹ H和²⁹ Si NMR光谱，元素分析和尺寸排阻色谱进行表征。二氧化硅薄膜是通过将PEOS和环己醇改性的PEOS（CH-PEOS）的氯仿溶液旋涂在硅片基板上并随后涂覆H _2形成的-等离子体处理。含有光酸的CH-PEOS层可以在紫外线照射下交联。该方法用于显影图案化的二氧化硅薄膜，并通过场发射扫描电子显微镜和原子力显微镜对其进行分析。获得明确定义的锐利的二氧化硅图案，并且通过使用H ₂等离子体处理除去有机物质，将层进一步转化为纯二氧化硅。