Transfer printing processes with resolution approaching 10 nm are not very common because pattern fidelity is often lost due to translational motion of the patterning molecules. To overcome this challenge, we describe here a photochemical transfer printing (PTP) process in which covalent bonds are formed between a nanopatterned master film formed by self-assembled poly(styrene)-block-poly(methyl methacrylate) (PS-b-PMMA) and solution-deposited conformal layer poly(styrenesulfonylazide-alt-maleic anhydride) in the solid state, where the pattern is fully stable. The monolayer of grafted PS-b-PMMA is then transferred to an initially blank replica film using a photopolymerizable liquid conformal layer possessing very low viscosity (hexanedioldiacrylate, 9 cP), which is known to promote dimensional uniformity in UV nanoimprint technology. The chemical nanopatterns transferred to the replica substrate is continuous and robust enough to successfully direct the self-assembly of new PS-b-PMMA films cast upon it after thermal annealing. The experiments in this work demonstrate patterning resolution down to 14 nm half-periodicity. The PTP process is mechanistically controlled by light and therefore can be spatially controlled by photomasks.

中文翻译：

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嵌段共聚物纳米图案的空间可控且均匀的光化学转移印刷†

分辨率接近10 nm的转移印刷工艺不是很常见，因为图案保真度通常由于图案分子的平移运动而丢失。为了克服这一挑战，我们在这里描述了其中通过自组装聚（苯乙烯）形成的纳米图案主膜之间形成共价键光化学转移印花（PTP）过程-嵌段-聚（甲基丙烯酸甲酯）（PS- b -PMMA ）和溶液沉积共形层的聚（styrenesulfonylazide- ALT在固体状态，其中所述图案是完全稳定-马来酸酐）。单层接枝PS- b然后，使用具有非常低粘度的可光聚合液体保形层（己二醇二丙烯酸酯，9 cP）将-PMMA转移到最初的空白复制膜上，众所周知，这在UV纳米压印技术中可促进尺寸均匀性。转移到复制衬底上的化学纳米图案是连续且坚固的，足以在热退火之后成功地引导流延在其上的新PS- b -PMMA薄膜的自组装。这项工作中的实验证明了图案分辨率低至14 nm半周期。PTP过程由光机械控制，因此可以由光掩模在空间上控制。