Abstract Sputtering yield measurements of metals using ion beam devices and high-flux plasma facilities are compared. During light inert gas bombardment, a general decrease in the sputtering yield is observed as the flux of energetic particles to the target increases. However, during heavy inert gas bombardment, the decrease is not observed and measurements agree with ion beams and binary collision approximation calculations. A potential cause, accumulation of gas atoms within the implantation zone, is hypothesized to be the culprit and various in-situ surface diagnostic techniques to measure the gas composition in the near surface of the metal targets are discussed.

中文翻译：

---

在高通量等离子体环境中溅射

摘要 比较了使用离子束设备和高通量等离子体设备对金属的溅射产率测量。在轻惰性气体轰击期间，随着高能粒子流向靶材的通量增加，观察到溅射产额普遍下降。然而，在重惰性气体轰击期间，没有观察到减少，测量结果与离子束和二元碰撞近似计算一致。一个潜在的原因，即注入区中气体原子的积累，被假设为罪魁祸首，并讨论了各种原位表面诊断技术来测量金属靶材近表面的气体成分。