Patterning of nanostructures with sub-200 nm periodicities over cm²-scale areas is challenging using standard approaches. This paper demonstrates a scalable technique for feature-density doubling that can generate nanopatterned lines with periodicities down to 100 nm covering >3 cm². We developed a process based on controlled wet overetching of atomic-layer deposited alumina to tune feature sizes of alumina masks down to several nm. These features transferred into silicon served as masters for template-stripping aluminum nanogratings with three different periodicities. The aluminum nanogratings supported surface plasmon polariton modes at ultraviolet wavelengths that, in agreement with calculations, depended on periodicity and incident excitation angle.

中文翻译：

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紫外等离子的顺序特征-密度加倍

使用标准方法，在cm ²规模的区域上以低于200 nm的周期形成纳米结构的图案是具有挑战性的。本文演示了一种用于特征密度加倍的可扩展技术，该技术可以生成周期低至100 nm，覆盖> 3 cm ^2的纳米图案线。我们开发了一种基于对原子层沉积的氧化铝进行可控的湿法过度蚀刻的工艺，以将氧化铝掩模的特征尺寸调节至几纳米。将这些特征转移到硅中，作为具有三个不同周期性的模板剥离铝纳米光栅的母版。铝纳米光栅在紫外波长下支持表面等离振子极化模式，这与计算一致，取决于周期性和入射激发角。