当前位置: X-MOL 学术Appl. Phys. Lett. › 论文详情
Our official English website, www.x-mol.net, welcomes your feedback! (Note: you will need to create a separate account there.)
Tailoring Al-SiO2 interfacial work function using an organophosphonate nanolayer
Applied Physics Letters ( IF 4 ) Pub Date : 2017-09-18 , DOI: 10.1063/1.4995433
Matthew Kwan 1 , Roy Winter 2 , P. Hubert Mutin 3 , Moshe Eizenberg 2 , Ganpati Ramanath 1
Affiliation  

We show that introducing a mercaptan-terminated organophosphonate nanomolecular layer (NML) at the Al-SiO2 interface decreases the effective metal work function Φeff by 0.67 eV. In contrast, introducing a methyl-terminated organophosphonate NML has a negligible impact on Φeff. Photoelectron spectroscopy of NML-tailored surfaces and Al-NML-SiO2 interfaces indicate that Al bonds with oxidized mercaptan moieties form Al-O-S bridges, which determine the Φeff shift. Our findings should be useful for molecularly tailoring the electronic properties of metal-ceramic interfaces for electronics and energy device applications.

中文翻译:

使用有机膦酸盐纳米层定制 Al-SiO2 界面功函数

我们表明,在 Al-SiO2 界面引入硫醇封端的有机膦酸酯纳米分子层 (NML) 可将有效金属功函数 Φeff 降低 0.67 eV。相比之下,引入甲基封端的有机膦酸酯 NML 对 Φeff 的影响可以忽略不计。NML 定制表面和 Al-NML-SiO2 界面的光电子能谱表明,Al 键与氧化硫醇部分形成 Al-OS 桥,这决定了 Φeff 位移。我们的发现应该有助于为电子和能源设备应用分子定制金属-陶瓷界面的电子特性。
更新日期:2017-09-18
down
wechat
bug