Abstract This study reports on the changes of the structural and optical properties occurring in CrN thin films upon Ag ion implantation. The films were grown by reactive sputtering on top of Si (100) wafers at a temperature of around 150 °C. Subsequently, the films were implanted with Ag ion fluences in the range of 0.5 × 1016 ions/cm2 ‒ 2 × 1016 ions/cm2 with energy of 200 keV. The structural and morphological changes, promoted by in-vacuum annealing of the as-implanted thin films at 200 °C, 400 °C and 700 °C, resulted in different optical responses of the CrN:Ag films due to the formation of Ag nanoparticles. The nanoparticles were inhomogenously distributed through the layer, which is related to the implantation distribution of silver in CrN. Apart from this, Ag nanoparticles with a size of 20–25 nm were formed at the surface of the layer. These structural properties are responsible for the formation of a broad optical absorption peak. This peak is located at ∼420 nm and can be associated with the plasmon resonance of Ag particles embedded in the CrN matrix.

中文翻译：

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Ag注入CrN薄膜的结构和光学性能随退火温度的演变

摘要 本研究报告了银离子注入后 CrN 薄膜的结构和光学特性的变化。在大约 150 °C 的温度下，通过反应溅射在 Si (100) 晶片上生长薄膜。随后，以 200 keV 的能量向薄膜注入 0.5 × 1016 离子/cm2 - 2 × 1016 离子/cm2 范围内的 Ag 离子注量。在 200 °C、400 °C 和 700 °C 下真空退火所促进的结构和形态变化导致 CrN:Ag 薄膜由于 Ag 纳米颗粒的形成而产生不同的光学响应. 纳米颗粒不均匀地分布在整个层中，这与银在 CrN 中的注入分布有关。除此之外，在层的表面形成了尺寸为 20-25 nm 的 Ag 纳米粒子。这些结构特性是形成宽光吸收峰的原因。该峰位于~420 nm 处，可能与嵌入 CrN 基质中的 Ag 颗粒的等离子体共振有关。