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Organic-Inorganic Hybrid Photoresists Containing Hexafluoroantimonate: Design, Synthesis and High Resolution EUV Lithography Studies
Materials Chemistry Frontiers ( IF 7 ) Pub Date : 2017-09-12 00:00:00 , DOI: 10.1039/c7qm00343a
Pulikanti Guruprasad Reddy 1, 2, 3 , Pawan Kumar 2, 3, 4 , Subrata Ghosh 1, 2, 3 , Chullikkattil P. Pradeep 1, 2, 3 , Satinder K. Sharma 2, 3, 4 , Kenneth E. Gonsalves 1, 2, 3
Affiliation  

Although many organic polymer based photoresists are useful for patterning high resolution sub-20 nm technology nodes, many of such resists suffer from poor sensitivity. One of the methods to address the problem of low sensitivity is to incorporate inorganic components into the organic polymer resist formulations. The present work demonstrates the incorporation of an inorganic counter ion moiety, hexafluoroantimonate, into an organic polymer photoresist, poly(4-(methacryloyloxy)phenyldimethylsulfoniumtriflate (poly-MAPDST), to improve its sensitivity. This approach resulted in two novel radiation sensitive hybrid non-chemically amplified resists (n-CARs), 1.5%-&2.15%-MAPDSA-MAPDST, having different percentages (1.5 % & 2.15 % respectively) of MAPDSA incorporated into poly-MAPDST backbone (where MAPDSA = (4-(methacryloyloxy)phenyl)dimethylsulfonium hexaflouroantimonate). These hybrid resists are sensitive towards extreme ultraviolet (EUV, λ = ̴ 13.5 nm) radiations and successfully patterned high resolution 20 nm lines as well as various complex nano features including nano-waves, nano-boats, line-elbows, nano-dots and circular patterns. The sensitivity exhibited by 1.5%-&2.15%-MAPDSA-MAPDST resists were calculated as 58.1 mJ/cm2 and 24.5 mJ/cm2 respectively from normalized remaining thickness (NRT) curve anaylsis, which reveals improved sensitivity as compared to poly-MAPDST resist.

中文翻译:

包含六氟锑酸的有机-无机杂化光致抗蚀剂:设计,合成和高分辨率EUV光刻研究

尽管许多基于有机聚合物的光致抗蚀剂可用于对分辨率低于20 nm的高分辨率技术节点进行图案化,但许多此类抗蚀剂的感光度均较差。解决低灵敏度问题的方法之一是将无机成分掺入有机聚合物抗蚀剂配方中。本工作证明了将无机抗衡离子部分六氟锑酸盐掺入有机聚合物光致抗蚀剂聚(4-(甲基丙烯酰氧基)苯基二甲基f三氟甲磺酸盐(poly-MAPDST))中以提高其感光度,这种方法导致了两种新型的辐射敏感杂化非-化学放大抗蚀剂(n-CARs),1.5%-&2.15%-MAPDSA-MAPDST,具有不同的百分比(1.5%和2。MAPDSA分别掺入聚-MAPDST主链中(其中MAPDSA =(4-(甲基丙烯酰氧基氧基)苯基)二氟六氟锑酸ate)15%的MAPDSA。这些混合抗蚀剂对极端紫外线(EUV,λ= 3.5 13.5 nm)辐射敏感,并成功地图案化了高分辨率20 nm线以及各种复杂的纳米特征,包括纳米波,纳米船,线肘,纳米点和圆形图案。根据归一化剩余厚度(NRT)曲线分析,1.5%-&2.15%-MAPDSA-MAPDST抗蚀剂表现出的感光度分别为58.1 mJ / cm2和24.5 mJ / cm2,与聚MAPDST抗蚀剂相比显示出更高的感光度。5纳米)辐射并成功地图案化了高分辨率20纳米线以及各种复杂的纳米特征,包括纳米波,纳米舟,线肘,纳米点和圆形图案。根据归一化剩余厚度(NRT)曲线分析,1.5%-&2.15%-MAPDSA-MAPDST抗蚀剂表现出的感光度分别为58.1 mJ / cm2和24.5 mJ / cm2,与聚MAPDST抗蚀剂相比显示出更高的感光度。5纳米)辐射并成功地图案化了高分辨率20纳米线以及各种复杂的纳米特征,包括纳米波,纳米舟,线肘,纳米点和圆形图案。根据归一化剩余厚度(NRT)曲线分析,1.5%-&2.15%-MAPDSA-MAPDST抗蚀剂表现出的感光度分别为58.1 mJ / cm2和24.5 mJ / cm2,与聚MAPDST抗蚀剂相比显示出更高的感光度。
更新日期:2017-09-12
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