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Observation and Characterization of CH3CH2–MH, (CH2)2–MH2, CH2═CH–MH3, and CH3–C≡MH3– Produced by Reactions of Group 5 Metal Atoms with Ethane
The Journal of Physical Chemistry A ( IF 2.9 ) Pub Date : 2017-08-31 00:00:00 , DOI: 10.1021/acs.jpca.7b06571
Han-Gook Cho 1 , Lester Andrews 2
Affiliation  

The primary products in reactions of laser-ablated group 5 metal atoms with ethane were identified in argon matrix IR spectra and characterized via density functional theory computations. The second- and third-row transition metals Nb and Ta produced insertion, metallacyclopropane, vinyl trihydrido, and anionic ethylidyne complexes (CH3CH2–MH, (CH2)2–MH2, CH2═CH–MH3, and CH3C≡MH3), while the first-row transition metal V yielded only the insertion and metallacyclopropane products. The energetically higher ethylidenes and neutral ethylidynes (CH3CH═MH2 and CH3CMH3) were not detected. The unique anionic ethylidynes are the most stable anionic species in the Nb and Ta systems. Evidently back-donation from the metal center to the C–C π* orbital is stronger than that in the group 6 metal analogue but weaker than that in the corresponding group 4 metal complex. The C–M bond for the Nb and Ta ethylidyne anions is a true triple bond.

中文翻译:

观察和CH表征3 CH 2 -MH,(CH 22 -MH 2,CH 2 = CH-MH 3,和CH 3 -C≡MH 3 -通过用乙烷5族金属原子的反应所产生的

在氩气基体红外光谱中鉴定了激光烧蚀的5族金属原子与乙烷反应的主要产物,并通过密度泛函理论计算对其进行了表征。第二和第三行过渡金属Nb和Ta产生插入,metallacyclopropane,乙烯基trihydrido和阴离子乙川络合物(CH 3 CH 2 -MH,(CH 22 -MH 2,CH 2 = CH-MH 3,和CH 3 C≡MH 3 - ),而第一行过渡金属V仅产生的插入和metallacyclopropane产品。能量较高的亚乙基和中性亚乙炔基(CH 3 CH 2MH 2和CH 3 C MH 3)没有被检测到。独特的阴离子乙炔是Nb和Ta系统中最稳定的阴离子物质。显然,从金属中心向C–Cπ*轨道的反向捐赠比第6组金属类似物强,但比相应的第4组金属络合物弱。Nb和Ta乙炔阴离子的C–M键是真正的三键。
更新日期:2017-08-31
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