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High-Throughput Structural and Functional Characterization of the Thin Film Materials System Ni–Co–Al
ACS Combinatorial Science ( IF 3.903 ) Pub Date : 2017-08-11 00:00:00 , DOI: 10.1021/acscombsci.6b00176
Peer Decker 1 , Dennis Naujoks 1 , Dennis Langenkämper 1 , Christoph Somsen 1 , Alfred Ludwig 1
Affiliation  

High-throughput methods were used to investigate a Ni–Co–Al thin film materials library, which is of interest for structural and functional applications (superalloys, shape memory alloys). X-ray diffraction (XRD) measurements were performed to identify the phase regions of the Ni–Co–Al system in its state after annealing at 600 °C. Optical, electrical, and magneto-optical measurements were performed to map functional properties and confirm XRD results. All results and literature data were used to propose a ternary thin film phase diagram of the Ni–Co–Al thin film system.

中文翻译:

薄膜材料系统Ni-Co-Al的高通量结构和功能表征

高通量方法用于研究Ni-Co-Al薄膜材料库,这对于结构和功能应用(超级合金,形状记忆合金)很重要。在600°C退火后,进行了X射线衍射(XRD)测量以鉴定Ni-Co-Al系统状态下的相区。进行了光学,电学和磁光测量,以绘制功能特性图并确认XRD结果。所有的结果和文献资料都被用来提出Ni-Co-Al薄膜系统的三元薄膜相图。
更新日期:2017-08-11
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